Pattern matching (PM) was first introduced as the semiconductor industry began to shift from simple one-dimensional rule checks to the two-dimensional checks required by sub-resolution lithography.
Context-aware checks integrate physical and electrical information to evaluate a wide range of design conditions, from advanced design rule compliance, to circuit and reliability verification, to ...
. Tadahiko Yamamoto is Chief Specialist, Design Methodology Development Group, at Toshiba Corp. . Norikazu Ooishi is Specialist, Design Methodology Group, at Toshiba Corp. Physical designers moving to ...
Enabling designers to perform block and cell physical verification from within layout environments such as Cadence's Virtuoso is Mentor Graphics' Calibre Interactive. This latest version in a ...